Chemical Research in Chinese Universities ›› 2016, Vol. 32 ›› Issue (4): 669-673.doi: 10.1007/s40242-016-5506-y

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Studies on Growth of N-Polar InN Films by Pulsed Metal-organic Vapor Phase Epitaxy

ZHAO Baijun1,2, HAN Xu1, YANG Fan1, DONG Xin1, ZHANG Yuantao1   

  1. 1. State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, P. R. China;
    2. Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, P. R. China
  • Received:2015-12-25 Revised:2016-06-03 Online:2016-08-01 Published:2016-06-27
  • Contact: DONG Xin,ZHANG Yuantao E-mail:dongx@jlu.edu.cn;zhangyt@jlu.edu.cn
  • Supported by:

    Supported by the the National Basic Research Program of China(No.2011CB302005), the National Natural Science Foundation of China(Nos.61106003, 61274023, 61376046, 61223005), the Science and Technology Developing Project of Jilin Province, China(Nos.20130204032GX, 20150519004JH) and the Program for New Century Excellent Talents in Universities of China(No.NCET-13-0254).

Abstract:

We reported the growth of N-polar InN films on N-polar GaN/sapphire substrates by pulsed metal-organic vapor phase epitaxy. The crystalline quality, surface morphology, optical and electrical properties of N-polar InN films were investigated in details by varying the breaking time and trimethylindium(TMIn) duration of pulse cycle. It has been found that when the breaking time and the TMIn duration in each cycle remain at 30 and 60 s, respectively, the N-polar InN film obtained exhibits a better crystalline quality and greater optical properties. Meanwhile, the surface morphology and electrical properties of the N-polar InN films also greatly depend on the given growth conditions.

Key words: N-Polar, Pulsed metal-organic vapor phase epitaxy, InN