Characterization and Wettability of ZnO Film Prepared by Chemical Etching Method

doi:10.1007/s40242-013-2181-0

Abstract

Abstract:

ZnO thin films were prepared by a chemical etching method and their wettability was investigated. The structure and surface composition structure were characterized by means of scanning electron microscopy, X-ray photoelectronic spectrometry(XPS), X-ray diffraction(XRD) and Raman spectrometry. These analyses reveal that the etched films were large-scale micro-nanohierarchical structures composed of a Zn core and a ZnO coating. Superhydrophobic surfaces with water contact angles of over 150o were obtained by n-octadecanethiol(ODT) modification. The XPS and Raman results indicate that ODT molecules were bound to the ZnO surface with the S head group by forming Zn-S bond.

Key words: ZnO, Chemical etching, Micro-nanostructure, Raman spectrometry, Wettability

GUO Hua-xi, JIA Hui-ying, ZENG Jian-bo, CONG Qian, REN Lu-quan. Characterization and Wettability of ZnO Film Prepared by Chemical Etching Method[J]. Chemical Research in Chinese Universities, 2013, 29(2): 333-337.

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