Evaporation-induced Morphology Pattern of Triblock Copolymer A5B10C5 in Thin Film：a Multibody DPD Simulation Study

doi:10.1007/s40242-013-3260-y

Chemical Research in Chinese Universities ›› 2014, Vol. 30 ›› Issue (1): 144-148.doi: 10.1007/s40242-013-3260-y

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Evaporation-induced Morphology Pattern of Triblock Copolymer A₅B₁₀C₅ in Thin Film：a Multibody DPD Simulation Study

LI Yang¹, WANG Dequan¹, WANG Wei¹, LI Yanchun^1,2, HUANG Xuri¹, SUN Chiachung¹, JIN Mingxing²

1. State Key Laboratory of Theoretical and Computational Chemistry, Institute of Theoretical Chemistry, Jilin University, Changchun 130021, P. R. China;
2. Institute of Atomic and Molecular Physics, Jilin University, Changchun 130012, P. R. China

Received:2013-06-17 Revised:2013-09-22 Online:2014-02-01 Published:2013-10-11
Contact: LI Yanchun,E-mail:liyanchun@jlu.edu.cn E-mail:liyanchun@jlu.edu.cn
Supported by:
Supported by the National Natural Science Foundation of China(Nos.21103064, 21173097, 21073075) and the Basic Research Fund of Jilin University, China(Nos.450060481158, 450060491249).

Abstract

Abstract:

We used multibody dissipative particle dynamics method, by which the attractive and repulsive interactions can be effectively considered, to investigate the evaporation-induced morphology patterns of triblock copolymer A₅B₁₀C₅ in thin film. With changing attractive interactions between solvent vapor and triblock copolymer that represent various selective solvents, lamellar morphology, sandwich lamellar morphology, spherical morphology and disorder morphology patterns of the thin films were obtained for both coil-coil-coil and rod-coil-coil chain architectures, respectively. The order parameter and the film thickness were calculated during the process for characterizing the film properties, and it was found that the rigid A-block of the triblock copolymer hinders the formation of an ordered structure.

Key words: Multibody dissipative particle dynamics, Evaporation-induced, Morphology pattern, Thin film

LI Yang, WANG Dequan, WANG Wei, LI Yanchun, HUANG Xuri, SUN Chiachung, JIN Mingxing. Evaporation-induced Morphology Pattern of Triblock Copolymer A₅B₁₀C₅ in Thin Film：a Multibody DPD Simulation Study[J]. Chemical Research in Chinese Universities, 2014, 30(1): 144-148.

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Evaporation-induced Morphology Pattern of Triblock Copolymer A₅B₁₀C₅ in Thin Film：a Multibody DPD Simulation Study

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