Chemical Research in Chinese Universities ›› 1989, Vol. 5 ›› Issue (3): 276-278.
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Luo Wenxiu, Tan Zhongke
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Key words: The organometallic chemical vapor deposition (MOCVD), Oxide films, Thin film growth
Luo Wenxiu, Tan Zhongke . Studies on the Thin Film of TiO2, Fe2O3 and SnO2 by the Organometallic-CVD Technique[J]. Chemical Research in Chinese Universities, 1989, 5(3): 276-278.
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