Chemical Research in Chinese Universities ›› 1989, Vol. 5 ›› Issue (3): 276-278.

• Articles • Previous Articles     Next Articles

Studies on the Thin Film of TiO2, Fe2O3 and SnO2 by the Organometallic-CVD Technique

Luo Wenxiu, Tan Zhongke   

  1. Qingdao Institute of Chemical Technology, Quigdao
  • Received:1988-06-08 Online:1989-08-24 Published:2011-09-09

Key words: The organometallic chemical vapor deposition (MOCVD), Oxide films, Thin film growth