Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography

doi:10.1007/s40242-022-2163-1

Chemical Research in Chinese Universities ›› 2023, Vol. 39 ›› Issue (1): 139-143.doi: 10.1007/s40242-022-2163-1

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Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography

HU Shengwen^1,3, CHEN Jinping¹, YU Tianjun¹, ZENG Yi^1,3, YANG Guoqiang^2,3, LI Yi^1,3

1. Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, P. R. China;
2. Beijing National Laboratory for Molecular Sciences(BNLMS), Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing, 100190, P. R. China;
3. University of Chinese Academy of Sciences, Beijing, 100049, P. R. China

Received:2022-05-05 Online:2023-02-01 Published:2023-02-02
Contact: CHEN Jinping, YANG Guoqiang, LI Yi E-mail:chenjp@mail.ipc.ac.cn;gqyang@iccas.ac.cn;null
Supported by:
This work was supported by the National Natural Science Foundation of China (Nos.22090012, U20A20144).

Abstract

Abstract: A novel dendritic molecular glass(MG) containing adamantane core(AD-15) was synthesized and characterized. It exhibits good solubility in common organic solvents and a stable amorphous state at room temperature, which contributes to forming films with different thicknesses by spin-coating. The thermal analysis of AD-15 indicates that no apparent glass transition temperature(T_g) is observed before the thermal decomposition temperature(T_d=160 ℃). The good thermal resistance suggests that it can satisfy the lithographic process and is a candidate for photoresist materials. The patterning properties of AD-15 resist were evaluated by electron beam lithography(EBL). By optimizing the lithographic process parameters, AD-15 resist can achieve 40 nm half-pitch patterns with a line-edge roughness of 4.0 nm. The contrast and sensitivity of AD-15 resist were 1.9 and 67 μC/cm², respectively. Compared with the commercial PMMA(950k) electron beam resist, the sensitivity of AD-15 resist increases by 6 times. This study provides a new example of molecular glass resist with high resolution and sensitivity for EBL.

Key words: Dendritic molecule, Molecular glass, Chemically amplified resist, Electron beam lithography

HU Shengwen, CHEN Jinping, YU Tianjun, ZENG Yi, YANG Guoqiang, LI Yi. Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography[J]. Chemical Research in Chinese Universities, 2023, 39(1): 139-143.

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Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography

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