Abstract: Photosensitive organosilicon monomers and polymers containing furylacrylate, cinnamate or methacrylate groups were synthesized. The chemical structure of these organosilicon monomers were confirmed by 1H NMR and elemental analysis.The curing rates of these photosensitive polysiloxanes were also determined, all of them show a good UV-sensitivity. The UV-sensitivity of polysiloxanes containing pendent furylacrylates are comparable to that of polysiloxanes with either pendent cinnamate or pendent methacrylate groups.

Key words: Photosensitive polysiloxanes, UV-curing, Furylacrylates, Cinnamates, Methacrylates