高等学校化学研究 ›› 2014, Vol. 30 ›› Issue (4): 556-559.doi: 10.1007/s40242-014-3556-6
YANG Dechao1,2, LIANG Hongwei3,4, QIU Yu3, LI Pengchong3, LIU Yang3, SHEN Rensheng3, XIA Xiaochuan3, YU Zhennan5, CHANG Yuchun1, ZHANG Yuantao1, DU Guotong1,3
YANG Dechao1,2, LIANG Hongwei3,4, QIU Yu3, LI Pengchong3, LIU Yang3, SHEN Rensheng3, XIA Xiaochuan3, YU Zhennan5, CHANG Yuchun1, ZHANG Yuantao1, DU Guotong1,3
摘要:
Cone-shaped patterned sapphire substrate was prepared by inductively coupled plasma etching and GaN nucleation layer was grown on it by metal-organic chemical vapor deposition. A selective growth of GaN nucleation layer was found on the slope of the cone-shaped patterned sapphire substrat, and the distribution morphology of GaN had significantly changed after it was recrystallized. GaN selective growth and redistribution were analyzed by investigating the distribution of crystallographic planes on the cone surface and the atom array of specific planes at atom level.