Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography
HU Shengwen, CHEN Jinping, YU Tianjun, ZENG Yi, YANG Guoqiang, LI Yi
Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography
HU Shengwen, CHEN Jinping, YU Tianjun, ZENG Yi, YANG Guoqiang, LI Yi
高等学校化学研究
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2023, (1): 139
-143
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DOI: 10.1007/s40242-022-2163-1