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高等学校化学研究 ›› 2001, Vol. 17 ›› Issue (S1): 113-113.

• Articles • 上一篇    下一篇

Metal Chemical Vapor Deposition:Design and Synthesis of New Source Reagents for Osmium Thin Films

YU Huan-Li, CHOU Tsung-Yi, CHI Yun   

  1. Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Taiwan
  • 出版日期:2001-12-31 发布日期:2016-03-14

Metal Chemical Vapor Deposition:Design and Synthesis of New Source Reagents for Osmium Thin Films

YU Huan-Li, CHOU Tsung-Yi, CHI Yun   

  1. Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Taiwan
  • Online:2001-12-31 Published:2016-03-14

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摘要：

Treatment of β-diketone ligands,such as hfacH(hexafluoroacelylacetone) or tmhdH(2,2-dimethyl-3,5-heptanedione),with binary metal carbonyls Ru3(CO)12 or Os3(CO)12 in a stainless steel autoclave at elevated temperature afforded the corresponding mononuclear Ru or Os complexes 1,2 and 3 in good yields.

Abstract:

Treatment of β-diketone ligands,such as hfacH(hexafluoroacelylacetone) or tmhdH(2,2-dimethyl-3,5-heptanedione),with binary metal carbonyls Ru3(CO)12 or Os3(CO)12 in a stainless steel autoclave at elevated temperature afforded the corresponding mononuclear Ru or Os complexes 1,2 and 3 in good yields.